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1
Regular Fabrics in Deep Sub-Micron Integrated-Circuit Design
Challenges in the Deep Sub-Micron Era IC fabrication technology is often labeled with the minimum feature size, that is, the minimum width of the patterns that can be correctly fabricated. The feature size has been shrinking from 1-micron ...
Fan Mo, Robert K. Brayton,
2007
2
Sub-Half-Micron Lithography for ULSIs
" "This book will be of value to graduate students studying semiconductor-device fabrication, to engineers engaged in such fabrication and to designers of ULSI devices."--Jacket.
Katsumi Suzuki, Shinji Matsui, Yukinori Ochiai,
2000
3
Power Management of Digital Circuits in Deep Sub-Micron ...
This book provides an in-depth overview of design and implementation of leakage reduction techniques.
4
Matching Properties of Deep Sub-Micron MOS Transistors - Pagina ix
This book examines the matching properties of deep sub-micron MOS transistors. Microscopic fluctuations cause stochastic parameter fluctuations that affect the accuracy of the MOSFET. For analog circuits this determines the trade-off ...
Jeroen A. Croon, Willy M. C. Sansen, Herman E. Maes,
2006
5
Plasma Etching Processes for Sub-quarter Micron Devices: ...
Polysilicon Plug Recess Etch Process for Sub-Quarter Micron Devices G. Kaplita, IBM Microelectronics, ASTC, Hopewell Jet., NY R. Ranade and G. Mathad DDA, Infineon Technologies, Hopewell Jet., NY Recessing of polysilicon in deep ...
6
Low-Power Deep Sub-Micron CMOS Logic: Sub-threshold ... - Pagina ii
Ohio State University Related Titles: SYSTEMATIC DESIGN OF SIGMA-DELTA ANALOG-TO-DIGITAL CONVERTERS Bajdechi and Huijsing ISBN 1-4020-7945–1 LOW-POWER DEEP SUB-MICRON CMOS LOGIC van der Meer and van ...
P. van der Meer, A. van Staveren, Arthur van Roermund,
2012
7
Micron Technology Inc Patent Landscape Analysis – January ...
8000 S. Federal Way Boise, ID USA Overview Phone: +1-208-368-4000 Fax: N/A http://www.micron.com Micron Technology, Inc. (Micron) is a global manufacturer and marketer of semiconductor devices, principally NAND Flash, DRAM and ...
Reiner E. Jargosch, Joseph Jurich,
2014
8
Integrated Modeling of Chemical Mechanical Planarization ...
[46] J. Huang, H. C. Chen, J. Y. Wu and W. Lur, “Investigation of CMP micro-scratch in the fabrication of sub-quarter micron VLSI circuits,” 1999 CMP-MIC Conference, pp. 77-79, Santa Clara, CA, U.S. A., Feb. 1999. [47] K. Nicholes, R. Singh, ...
Jianfeng Luo, David A. Dornfeld,
2013
9
Frontiers in Nanoscale Science of Micron/Submicron Devices
A.-P. Jauho, Eugenia V. Buzaneva, North Atlantic Treaty Organization. Scientific Affairs Division. i = i0exp(-4>0/kT)[exp(q0V/kT) - 1] (18) In this case, the I — V differential slope Q = kT/q0d(logi)/dV = o?(max{4>0 - q0V^\,^})/dV = 1 (19) does not ...
A.-P. Jauho, Eugenia V. Buzaneva, North Atlantic Treaty Organization. Scientific Affairs Division,
1996
10
Micron-scale Wear Mechanisms in Ultra High Molecular ... - Pagina 83
James David Wernle. thought to be a factor in wear performance; however Hylamer exhibited much higher wear and a large revision rate, in vivo49. This indicated that mechanical properties alone are not responsible for material success.