10 LIVROS EM POLONÊS RELACIONADOS COM «NOWOLAK»
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nowolak na seguinte seleção bibliográfica. Livros relacionados com
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1
Advances in Cryogenic Engineering Materials - Strona 211
TGPAPs DGEBF1 DGEBAI Epoxy Epoxy Aromatic Aromatic Acid Nowolak Nowolak || Amine Amine Anhydride Prepreg Kapton Figure 7. Mean Moduli. released when the specimen fails and the relaxation in the rig crushes the failed specimen ...
2
Polymers in Information Storage Technology - Strona 163
CH, | | T IT n m Nowolak Developer Dissolved Nowolak O N coo e20 *No hi; =c-o /* Hoo \ OH" N-- "OU”, “OU 3, “OU′o no RSO, RSO, RSO, O-Naphthoguinone- Ketene 3-Indenecarboxylic Dissolved photodiazide acid active component ...
3
Prace Wydziału Nauk Technicznych - Wydania 2-7 - Strona 22
1913 S t 1 a sny []55j • Opracował on dwie metody otrzymywania syntanów: 1) fenol lub mieszaninę fenoli podaje się w kondensacji z formaldehydem w środowisku kwaśnym; otrzymany nowolak sulfonuje się, uzyskując produkt rozpuszczalny ...
Bydgoskie Towarzystwo Naukowe. Wydział Nauk Technicznych,
1963
4
1000 [i.e. Tysiąc] słów o tworzywach sztucznych - Strona 42
W środowisku kwaśnym i wobec nadmiaru fenolu powstaje, wskutek ogrzewania, trwale rozpuszczalny i topliwy, niezdolny do dalszej kondensacji nowolak. W środowisku alkalicznym wobec nadmiaru formaldehydu powstaje w wyniku ...
Stefan Chudzyński, Jan Puternicki, Wiktor Surowiak,
1975
5
Polymer Synthesis: Theory and Practice: Fundamentals, ... - Strona 245
... mixing with Sawdustand hexamethylenetetramine as follows: 25g offinely ground Nowolak, 25g of dry sawdust, 3.5g of hexamethylenetetramine, 1 g of magnesium oxide (to trapresidual acid from the condensation), and 0.5g of calcium ...
Dietrich Braun, Harald Cherdron, Helmut Ritter,
2013
6
Low-Dimensional Structures in Semiconductors: From Basic ...
R. Hox RH novolak CO2t-Bu nowolak CO2t-Bu + + 2) deprotection of polymer component hy– CC H+x- + + -(CH-CH2)n her -(CH-CHzh Araş"X: HX in soluble in _-CH3 aqueous alkali + CO2 + CH2=C `-cHs O CO2t-BU OH lak in soluble in ...
A.R. Peaker, H.G. Grimmeiss,
2013
7
Semiconductor Lithography: Principles, Practices, and ... - Strona 226
B 1.0 T. 0.8H 0.5 + 0-4o.2 - Nowolak 10” l l _ - - 10** 10* 10's 10* too Fluence (Particles/cm') l 10” (A) Profile of energy deposition by ions in resist. From Ref. 36, courtesy of AIP. (B) Comparison of exposure of novolak resin by ions of 1.5-MeV ...
8
Characterization of Porous Solids II - Strona 273
Further cross linking within the particles and chemical bonding between the particles then took place as the sample was heated to 150°C. PHENOLIC RESIN CARBON PRODUCTION ROUTE NOWOLAK RESIN PARTIAL CURE GRIND AND ...
KK Unger, F. Rodríguez-Reinoso, Jean Rouquerol,
1991
9
Phenolic Resins: Chemistry, Applications, Standardization, ...
Cresol Nowolak Microstructure Increased photoresist optical resolution occurs when cresol novolaks possess a high degree of ortho-ortho linkage to facilitate complexation with DNQ through a secondary “hydrogen-based” structural model as ...
A. Gardziella, L.A. Pilato, A. Knop,
2013
10
Deformation and Fracture Behaviour of Polymers - Strona 419
... amorphous carbon obtained, and the price and availability of the resin in the Polish market. According to these criteria, the following phenolic resins were chosen for further tests: 1 . the thermoplastic phenol-formaldehyde resin Nowolak 1 8 ...
Wolfgang Grellmann, Sabine Seidler,
2001